This deposition process was executed under the following conditions:
1. Duration: 120 seconds;
2. Isotropic deposition at 0.3 nm/s.
3. Directional deposition (normal incidence and 90 degrees divergence) at 1 nm/s.
4. The default initial structure was used.
Note that 90 degrees divergence corresponds to 180 degrees total spread, i.e. the deposition flux distribution is isotropic (but nevertheless directional).
